15 February 1990 Recent Applications Of Finely Focused Eb/Ib Tecindlogies For Multichamber And In-Situ Processing
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Proceedings Volume 1188, Multichamber and In-Situ Processing of Electronic Materials; (1990) https://doi.org/10.1117/12.963944
Event: 1989 Microelectronic Integrated Processing Conferences, 1989, Santa Clara, United States
Abstract
Finely focused ion and electron beams have been applied to processes of etching, implantation, and monitoring in multichamber in-situ processing systems. Each application has been evaluated and some remarkable achievements are reported.
© (1990) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
H. Sawaragi, H. Sawaragi, H. Kasahara, H. Kasahara, R. Mimura, R. Mimura, M. Obata, M. Obata, R. Aihara, R. Aihara, W. B. Thompson, W. B. Thompson, M. H. Shearer, M. H. Shearer, "Recent Applications Of Finely Focused Eb/Ib Tecindlogies For Multichamber And In-Situ Processing", Proc. SPIE 1188, Multichamber and In-Situ Processing of Electronic Materials, (15 February 1990); doi: 10.1117/12.963944; https://doi.org/10.1117/12.963944
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