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8 July 2021 On the use of multilayer Laue lenses with X-ray free electron lasers
Mauro Prasciolu, Kevin T. Murray, Nikolay Ivanov, Holger Fleckenstein, Martin Domaracký, Luca Gelisio, Fabian Trost, Kartik Ayyer, Dietrich Krebs, Steve Aplin, Salah Awel, Ulrike Boesenberg, Grega Belšak, Anton Barty, Armando D. Estillore, Matthias Fuchs, Yaroslav Gevorkov, Joerg Hallmann, Chan Kim, Juraj Knoška, Jochen Küpper, Chufeng Li, Wei Lu, Valerio Mariani, Andrew J. Morgan, Johannes Möller, Anders Madsen, Dominik Oberthür, Gisel E. Peña Murillo, David A. Reis, Markus Scholz, Božidar Šarler, Pablo Villanueva-Perez, Oleksandr Yefanov, Kara A. Zielinski, Alexey Zozulya, Henry N. Chapman, Saša Bajt
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Proceedings Volume 11886, International Conference on X-Ray Lasers 2020; 118860M (2021) https://doi.org/10.1117/12.2592229
Event: XVII International Conference on X-Ray Lasers, 2020, Online Only
Abstract
We report on the use of multilayer Laue lenses to focus the intense X-ray Free Electron Laser (XFEL) beam at the European XFEL to a spot size of a few tens of nanometers. We present the procedure to align and characterize these lenses and discuss challenges working with the pulse trains from this unique x-ray source.
© (2021) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
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Mauro Prasciolu, Kevin T. Murray, Nikolay Ivanov, Holger Fleckenstein, Martin Domaracký, Luca Gelisio, Fabian Trost, Kartik Ayyer, Dietrich Krebs, Steve Aplin, Salah Awel, Ulrike Boesenberg, Grega Belšak, Anton Barty, Armando D. Estillore, Matthias Fuchs, Yaroslav Gevorkov, Joerg Hallmann, Chan Kim, Juraj Knoška, Jochen Küpper, Chufeng Li, Wei Lu, Valerio Mariani, Andrew J. Morgan, Johannes Möller, Anders Madsen, Dominik Oberthür, Gisel E. Peña Murillo, David A. Reis, Markus Scholz, Božidar Šarler, Pablo Villanueva-Perez, Oleksandr Yefanov, Kara A. Zielinski, Alexey Zozulya, Henry N. Chapman, and Saša Bajt "On the use of multilayer Laue lenses with X-ray free electron lasers", Proc. SPIE 11886, International Conference on X-Ray Lasers 2020, 118860M (8 July 2021); https://doi.org/10.1117/12.2592229
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