23 February 1990 Laser-Induced Chemical Vapor Deposition of High-Purity Metals
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Proceedings Volume 1190, Laser/Optical Processing of Electronic Materials; (1990) https://doi.org/10.1117/12.963992
Event: 1989 Microelectronic Integrated Processing Conferences, 1989, Santa Clara, United States
Abstract
The laser chemical vapor deposition (LCVD) of aluminum and gold has been achieved via pyrolytic decomposition of trimethylamine aluminum hydride and dimethylgold (p-diketonates), respectively. The rates of metal deposition, the purity of the deposited metals and the electrical properties of the deposits are a direct result of the chemical and physical properties of the precursor and the metal.
© (1990) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Thomas H. Baum, Thomas H. Baum, } "Laser-Induced Chemical Vapor Deposition of High-Purity Metals", Proc. SPIE 1190, Laser/Optical Processing of Electronic Materials, (23 February 1990); doi: 10.1117/12.963992; https://doi.org/10.1117/12.963992
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