Presentation + Paper
4 March 2022 Thermal annealing of thin films using fiber lasers via the spot-beam annealing method
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Abstract
In this paper, we show via transient thermal analysis that the use of ultra-high-frequency high-power fiber lasers as implemented in the spot-beam annealing method makes it possible to (1) flexibly induce and mimic the overall annealing conditions that were accomplished previously using various other types of lasers, and (2) engineer and leverage the periodic and highly transient thermal spikes that arise due to the individual laser pulses. We point out and discuss how such annealing characteristics may be well-suited for optimally inducing structural/topological relaxation and compositional short-range ordering of amorphous thin films, as for instance are presumably involved in annealing of amorphous IGZO films on high-temperature-processing-intolerant glass/plastic substrates for fabricating stable oxide TFTs for AMOLED displays.
Conference Presentation
© (2022) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Ruobing Song, Bonan Shen, Nikita Lisenko, Jayoung Park, Wenkai Pan, Joshua Schoenly, Manuel Leonardo, Roger Dowd, and James S. Im "Thermal annealing of thin films using fiber lasers via the spot-beam annealing method", Proc. SPIE 11988, Laser Applications in Microelectronic and Optoelectronic Manufacturing (LAMOM) XXVII, 1198809 (4 March 2022); https://doi.org/10.1117/12.2611967
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KEYWORDS
Annealing

Thin films

Fiber lasers

Crystals

Silicon

Temperature metrology

Thermal analysis

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