UV line beam for display manufacturing

Andreas Heimes; Martin Wimmer; Torsten Beck; Christian Stolzenburg; Julian Hellstern; Christoph Tillkorn; Sören Richter; Thomas Zeller

doi:10.1117/12.2608238

4 March 2022 UV line beam for display manufacturing

Andreas Heimes, Martin Wimmer, Torsten Beck, Christian Stolzenburg, Julian Hellstern, Christoph Tillkorn, Sören Richter, Thomas Zeller

Author Affiliations +

Proceedings Volume 11989, Laser-based Micro- and Nanoprocessing XVI; 119890J (2022) https://doi.org/10.1117/12.2608238
Event: SPIE LASE, 2022, San Francisco, California, United States

Abstract

UV line beam optics are nowadays an integral part of manufacturing chains in semiconductor and display technology. Amongst others the most prominent applications are the large area annealing of semiconductor materials and the laser lift off process used e.g. for debonding of flexible displays. Here we report on a very flexible platform based on our DPSSL technology and a wavelength of 343 nm. This laser technology provides superior reliability combined with very high pulse energy stabilities. Within our optical design the beam shape along the scan direction can be either gaussian or tophat. We show which fluences can be achieved depending on beam shape and beam width and refer to the relevant applications.

Conference Presentation

Citation Download Citation

Andreas Heimes, Martin Wimmer, Torsten Beck, Christian Stolzenburg, Julian Hellstern, Christoph Tillkorn, Sören Richter, and Thomas Zeller "UV line beam for display manufacturing", Proc. SPIE 11989, Laser-based Micro- and Nanoprocessing XVI, 119890J (4 March 2022); https://doi.org/10.1117/12.2608238

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