High speed 850nm oxide VCSEL development for 100Gb/s ethernet at Broadcom

Jingyi Wang; M. V. Ramana Murty; Zheng-Wen Feng; Sumtro-Joyo Taslim; Aadi Sridhara; Xinle Cai; Nelvin Leong; Gim-Hong Koh; Andie Hioki; An-Nien Cheng; David W. Dolfi; Jason Chu; Laura M. Giovane

doi:10.1117/12.2607305

2 March 2022 High speed 850nm oxide VCSEL development for 100Gb/s ethernet at Broadcom

Jingyi Wang, M. V. Ramana Murty, Zheng-Wen Feng, Sumtro-Joyo Taslim, Aadi Sridhara, Xinle Cai, Nelvin Leong, Gim-Hong Koh, Andie Hioki, An-Nien Cheng, David W. Dolfi, Jason Chu, Laura M. Giovane

Author Affiliations +

Proceedings Volume 12020, Vertical-Cavity Surface-Emitting Lasers XXVI; 1202009 (2022) https://doi.org/10.1117/12.2607305
Event: SPIE OPTO, 2022, San Francisco, California, United States

Abstract

This paper reviews the VCSEL technology used to enable 100 Gb/s multi-mode optical links. Link performance, device characterization over temperature and wear-out lifetime will be presented. The manufacturability of these high performance and reliable VCSELs will be discussed.

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Jingyi Wang, M. V. Ramana Murty, Zheng-Wen Feng, Sumtro-Joyo Taslim, Aadi Sridhara, Xinle Cai, Nelvin Leong, Gim-Hong Koh, Andie Hioki, An-Nien Cheng, David W. Dolfi, Jason Chu, and Laura M. Giovane "High speed 850nm oxide VCSEL development for 100Gb/s ethernet at Broadcom", Proc. SPIE 12020, Vertical-Cavity Surface-Emitting Lasers XXVI, 1202009 (2 March 2022); https://doi.org/10.1117/12.2607305

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