At-wavelength optics characterization metrology at Shanghai Synchrotron Radiation Facility

Lian Xue; Zhongliang Li; Shangyu Si; Hongxin Luo

doi:10.1117/12.2626158

13 December 2021 At-wavelength optics characterization metrology at Shanghai Synchrotron Radiation Facility

Lian Xue, Zhongliang Li, Shangyu Si, Hongxin Luo

Proceedings Volume 12070, 10th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Large Mirror and Telescopes; 120700E (2021) https://doi.org/10.1117/12.2626158
Event: Tenth International Symposium on Advanced Optical Manufacturing and Testing Technologies (AOMATT 2021), 2021, Chengdu, China

Abstract

In recent years, X-ray phase sensing technology has been widely used in at-wavelength metrology and optical characterization. One of the latest developments is the technology based on X-ray speckle. It has attracted wide attention because of its simple and flexible experimental arrangement, high-cost performance, multi-mode, and high angular sensitivity. The speckle-based technique can precisely measure the wavefront and associated aberrations and is therefore a suitable device for in-situ metrology. Shanghai Synchrotron Radiation Facility (SSRF) has been implemented and further improved such a technique. We have demonstrated that the speckle-based technique can be used in the wavefront measurement of the reflective and transmissive optics and diffraction optics such as mirrors, lens, and crystals. This paper will introduce the latest developments in speckle-based wavelength measurement technology and some application examples at SSRF.

Citation Download Citation

Lian Xue, Zhongliang Li, Shangyu Si, and Hongxin Luo "At-wavelength optics characterization metrology at Shanghai Synchrotron Radiation Facility", Proc. SPIE 12070, 10th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Large Mirror and Telescopes, 120700E (13 December 2021); https://doi.org/10.1117/12.2626158

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