Paper
13 December 2021 Suppressing the edge roll off in continuous polishing of large planar optics by using extension blocks
Author Affiliations +
Abstract
The edge roll off seriously restricts the further improvement of the overall surface figure accuracy in CP of large planar optics. Firstly, the half width and depth of large planar optics’ edge region is proposed to quantify the roll off degree by analyzing its radial equivalent profile. Then, a two-dimensional symmetrical model of the large planar optics and the pitch lap is established. Next, based on the finite element model, the influence of extension block’s bonding state on the large planar optics edge’s stress concentration is analyzed. Finally, the effectiveness of this proposed method is verified by CP of large planar optics with extension blocks.
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Lele Ren, Feihu Zhang, Defeng Liao, Ruiqing Xie, Shijie Zhao, and Jian Wang "Suppressing the edge roll off in continuous polishing of large planar optics by using extension blocks", Proc. SPIE 12072, 10th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Micro- and Nano-Optics, Catenary Optics, and Subwavelength Electromagnetics, 120720L (13 December 2021); https://doi.org/10.1117/12.2604437
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KEYWORDS
Polishing

Surface finishing

Interfaces

Analytical research

Chemical mechanical planarization

Polyurethane

Semiconducting wafers

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