1 May 1990 Efficient electron-beam pattern data format for the production of binary computer-generated holograms
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Proceedings Volume 1211, Computer and Optically Formed Holographic Optics; (1990); doi: 10.1117/12.17924
Event: OE/LASE '90, 1990, Los Angeles, CA, United States
Abstract
Current pattern data formats for electron beam lithography are specifically designed to meet the needs of the VLSI industry. As a result, pattern data file size is often the limiting factor in the production of a binary computer generated hologram and not the spatial bandwidth product. This paper explores one alternate pattern data format that facilitates the full utilization of the e-beam machine's spatial bandwidth product without introducing prohibitive amounts of pattern data. The pattern data format uses two well established data compression techniques specifically tailored to remove the redundancies present in holographic fringe patterns.
© (1990) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Robert W. Hawley, Neal C. Gallagher, "Efficient electron-beam pattern data format for the production of binary computer-generated holograms", Proc. SPIE 1211, Computer and Optically Formed Holographic Optics, (1 May 1990); doi: 10.1117/12.17924; https://doi.org/10.1117/12.17924
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KEYWORDS
Raster graphics

Binary data

Computer generated holography

Computer programming

Holography

Holograms

Wavefronts

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