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1 May 1990 Highly sensitive positive resists for holography
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Proceedings Volume 1212, Practical Holography IV; (1990) https://doi.org/10.1117/12.17969
Event: OE/LASE '90, 1990, Los Angeles, CA, United States
Abstract
New visibile llight sensitive positive type resists have been developed. The chemistry is based on the hydrolysis of polymers catalyzed by acid which is generated on sensitized photodecomposition of diphenyliodonium (DPI) salt. Dimethoxybenzhydryl methacrylate (DMOBHMA)-phenyl methacrylate (PhMA) copolymer was the best acid sensitive polymer tested, producing photoresists with sensitivity to an argon ion laser light and good holographic properties.
© (1990) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Kunihiro Ichimura and Yasushi Ohe "Highly sensitive positive resists for holography", Proc. SPIE 1212, Practical Holography IV, (1 May 1990); https://doi.org/10.1117/12.17969
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