Blazed reflection gratings with electron-beam lithography and ion-beam etching

Drew M. Miles; Randall L. McEntaffer; Fabien Grisé

doi:10.1117/12.2637880

31 August 2022 Blazed reflection gratings with electron-beam lithography and ion-beam etching

Drew M. Miles, Randall L. McEntaffer, Fabien Grisé

Proceedings Volume 12181, Space Telescopes and Instrumentation 2022: Ultraviolet to Gamma Ray; 1218153 (2022) https://doi.org/10.1117/12.2637880
Event: SPIE Astronomical Telescopes + Instrumentation, 2022, Montréal, Québec, Canada

Abstract

In modern X-ray-grating development for astronomical applications, electron-beam lithography has emerged as a primary fabrication approach to producing high-performance reflection gratings for both current and future missions. The work presented here leverages years of development in electron-beam lithography for X-ray gratings to produce a grating pattern that is then blazed with ion-beam etching. The directional ion-beam etching reshapes the groove facets to a consistent, triangular profile with a facet angle specified by the grating application. An initial prototype X-ray reflection grating fabricated with a combination of electron-beam lithography and ion-beam etching is presented here, along with diffraction efficiency performance measured across the soft-X-ray bandpass. This first prototype achieves ≈33% absolute diffraction efficiency from 0.2 to 1.2 keV, with an average peak-order efficiency of ≈17%. The fabrication approach, efficiency measurements, and path toward improved performance are presented.

Citation Download Citation

Drew M. Miles, Randall L. McEntaffer, and Fabien Grisé "Blazed reflection gratings with electron-beam lithography and ion-beam etching", Proc. SPIE 12181, Space Telescopes and Instrumentation 2022: Ultraviolet to Gamma Ray, 1218153 (31 August 2022); https://doi.org/10.1117/12.2637880

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KEYWORDS

Diffraction gratings

Etching

Diffraction

Reactive ion etching

Electron beam lithography

Silicon

Reflection

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