Poster + Paper
31 August 2022 CCAT-prime: the design and characterization of the silicon mirrors for the Fabry-Perot interferometer in the Epoch of reionization spectrometer
Author Affiliations +
Conference Poster
Abstract
The Epoch of Reionization Spectrometer (EoR-Spec) is one of the instrument modules to be installed in the Prime-Cam receiver of the Fred Young Submillimeter Telescope (FYST). This six-meter aperture telescope will be built on Cerro Chajnantor in the Atacama Desert in Chile. EoR-Spec is designed to probe early star-forming regions by measuring the [CII] fine-structure lines between redshift z = 3.5 and z = 8 using the line intensity mapping technique. The module is equipped with a scanning Fabry-Perot interferometer (FPI) to achieve the spectral resolving power of about RP = 100. The FPI consists of two parallel and identical, highly reflective mirrors with a clear aperture of 14 cm, forming a resonating cavity called etalon. The mirrors are silicon based and patterned with double-layer metamaterial anti-reflection coatings (ARC) on one side and metal mesh reflectors on the other. The double-layer ARCs ensure a low reflectance at one substrate surface and help tailor the reflectance profile over the FPI bandwidth. Here we present the design, fabrication processes, test setup, and characterization of silicon mirrors for the FPI.
© (2022) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Bugao Zou, Steve K. Choi, Nicholas F. Cothard, Rodrigo Freundt, Zachary B. Huber, Yaqiong Li, Michael D. Niemack, Thomas Nikola, Dominik A Riechers, Kayla M. Rossi, Gordon J. Stacey, and Eve M. Vavagiakis "CCAT-prime: the design and characterization of the silicon mirrors for the Fabry-Perot interferometer in the Epoch of reionization spectrometer", Proc. SPIE 12190, Millimeter, Submillimeter, and Far-Infrared Detectors and Instrumentation for Astronomy XI, 121902B (31 August 2022); https://doi.org/10.1117/12.2629518
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KEYWORDS
Silicon

Mirrors

Transmittance

Reflectivity

Semiconducting wafers

Etching

Dielectrics

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