1 June 1990 Pulsed laser technology in microelectronics
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Proceedings Volume 1225, High-Power Gas Lasers; (1990) https://doi.org/10.1117/12.18489
Event: OE/LASE '90, 1990, Los Angeles, CA, United States
Abstract
Laser processing methods have been widely used in microelectronics technology due to the following advantages: the zone of laser action can be decreased by focusing the beam into a small spot non-contact treatment eliminates undesirable introduction of impurities into laser-affected zone; the control of the energetic parameters and the spatial position of the treatment zone is relatively simple; laser treatment process is compatible with automatic control based on microprocessor systems. In this connection, the problem of laser radiation-substance interaction arises as well as the need for developing the technological processes ensuring high efficiency and quality of production, improvement of very large-scale integration (VLSI) parameters, and making products with unique characteristics.
© (1990) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Vladimir Michailovi Koleshko, Vladimir Michailovi Koleshko, A. V. Gulai, A. V. Gulai, } "Pulsed laser technology in microelectronics", Proc. SPIE 1225, High-Power Gas Lasers, (1 June 1990); doi: 10.1117/12.18489; https://doi.org/10.1117/12.18489
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