The power of algorithmic employed in a metrology system: AIMS EUV Digital Flex Illu

Renzo Capelli; Klaus Gwosch; Grizelda Kersteen; Matthias Roesch; Carolin Müller; Alexander Winkler; Andreas Verch

doi:10.1117/12.2641531

1 December 2022 The power of algorithmic employed in a metrology system: AIMS EUV Digital Flex Illu

Renzo Capelli, Klaus Gwosch, Grizelda Kersteen, Matthias Roesch, Carolin Müller, Alexander Winkler, Andreas Verch

Proceedings Volume 12292, International Conference on Extreme Ultraviolet Lithography 2022; 122920N (2022) https://doi.org/10.1117/12.2641531
Event: SPIE Photomask Technology + EUV Lithography, 2022, Monterey, California, United States

Abstract

Digital Flex Illu is a fully digital solution which provides SMO functionality to the AIMS® EUV system by combining an adaptation of the already built-in system metrology with a powerful algorithm and most importantly, without changing the machine hardware. In this paper, we will present the concept of Digital Flex Illu functionality, its significant advantages in combination with a binary aperture-based illumination concept, together with showing imaging results obtained on the AIMS® EUV prototype system. This digital solution is a paradigm change for the AIMS® EUV usability and final user, it allows ZEISS to guarantee an agile roadmap for the AIMS® EUV with limited development effort and great benefits in sustainability and roadmap scaling.

Conference Presentation

Citation Download Citation

Renzo Capelli, Klaus Gwosch, Grizelda Kersteen, Matthias Roesch, Carolin Müller, Alexander Winkler, and Andreas Verch "The power of algorithmic employed in a metrology system: AIMS EUV Digital Flex Illu", Proc. SPIE 12292, International Conference on Extreme Ultraviolet Lithography 2022, 122920N (1 December 2022); https://doi.org/10.1117/12.2641531

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