Analysis of in-situ monitoring technique for fabrication of high quality diffraction gratings used in integrated optical circuits

Jianping Xie

doi:10.1117/12.2294649

1 July 1990 Analysis of in-situ monitoring technique for fabrication of high quality diffraction gratings used in integrated optical circuits

Jianping Xie

Author Affiliations +

Proceedings Volume 1230, International Conference on Optoelectronic Science and Engineering '90; 12300C (1990) https://doi.org/10.1117/12.2294649
Event: The Marketplace for Industrial Lasers 1990, 1990, Chicago, IL, United States

Abstract

In developing process of photoresist, high quality diffraction grating can be fabricated on GaAs substrate by in-situ monitoring the diffraction intensity from the photoresist. The diffraction intensity variation with development is analyzed, and the optimum end point of developing is indicated in this paper. The analyses are good coincident with the experiment results.

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Jianping Xie "Analysis of in-situ monitoring technique for fabrication of high quality diffraction gratings used in integrated optical circuits", Proc. SPIE 1230, International Conference on Optoelectronic Science and Engineering '90, 12300C (1 July 1990); https://doi.org/10.1117/12.2294649

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