1 July 1990 Photoelectric centering and measuring instrument with double-pass zero position method
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Proceedings Volume 1230, International Conference on Optoelectronic Science and Engineering '90; 123028 (1990) https://doi.org/10.1117/12.2294717
Event: The Marketplace for Industrial Lasers 1990, 1990, Chicago, IL, United States
Abstract
A new type of high precision photoelectric centering instrument for measuring centering error of lens has been successfuly developed. It is used for processing and assembling of many precision lenses with resolution near diffraction limitation. The accuracy of the instrument for measuring centering error may be up to 1 arc second. The accuracy for measuring spherical center deviation is lit m and its optimum centering sensitivity is 0. 1it m. Using the instrument has successfuly completed fabrication and assemble of many precision lenses, such as reconnaissahce satellite camera lenses, reproduction lenses for manufacturing LSIC, flat field apochromatic microscopy objective with high amplification ratio, aerial photography lenses as well as plate -making lenses etc. . According to the appraisal national authoritits, the main technical specifications of the instrument are authenticated to exceed the same kind of instrument made abroad and come up to world advanced level in 1980's. This achievement in scientific research has won the first class Sciences and Technologies Progress Prize awarded by Chinese Academy of Sciences in 1987, and has obtained Chinese invention patent (patent number:CN 85 1 01621A).
© (1990) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Changxin Zhou, "Photoelectric centering and measuring instrument with double-pass zero position method", Proc. SPIE 1230, International Conference on Optoelectronic Science and Engineering '90, 123028 (1 July 1990); doi: 10.1117/12.2294717; https://doi.org/10.1117/12.2294717
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