1 July 1990 Monitoring the thickness of ZnO films on iso-axis magnetron sputtering using laser
Author Affiliations +
Proceedings Volume 1230, International Conference on Optoelectronic Science and Engineering '90; 12304H (1990) https://doi.org/10.1117/12.2294798
Event: The Marketplace for Industrial Lasers 1990, 1990, Chicago, IL, United States
Abstract
The film thickness monitoring technology is one of the factors in film manufacture. In isoaxis magnetron sputtering, to detect the film thickness in real time is very important. This paper presented a method which can monitor the thickness of ZnO films in a simple, quick and accurate way as well as in real time. The method is to trace the substrates on a TCT-300 type isoaxis magnetron sputtering machine using laser directly. The sputtering machine is made in our institute.
© (1990) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Kecheng Xie, Kecheng Xie, } "Monitoring the thickness of ZnO films on iso-axis magnetron sputtering using laser", Proc. SPIE 1230, International Conference on Optoelectronic Science and Engineering '90, 12304H (1 July 1990); doi: 10.1117/12.2294798; https://doi.org/10.1117/12.2294798
PROCEEDINGS
2 PAGES


SHARE
Back to Top