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1 February 1991 Investigation of the arsenic sulphide films for relief-phase holograms
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There were examined mechanisms of arsenic sulphide films dissolution In water and spirit solutions of alkalis and in protonic and aprotonic solutions of aliphatic amines as well. Optimum conditions for the arsenic sulphide films processing without formation of a sediment and ratio of dissolution velosity of exposed and as-deposited parts of film less then of thousand units were found. 1 . INTIODUCTION It is widely known that holografic gratings (HG) have many advantages over engineruled gratings: they are free from " ghosts" have a lower level of scattered light it is possible to obtain gratings with frequency beyond 3000 1/mm The usial technique of HG manufacturing uses organic photoresists. The photoresists based on the low-molecular phenol formaldehyde resists with positive type of development are a most common choice. It is known that these resists do not dissolve in water but does dissolve in alkaline solutions The dissolution proceeds by molecular fragments each consisting of 7-10 phenolic cycles2through the stage of swelling which leads to a marked ruoghness of the etched surface and the distortions of the relief profile when the value of resolutions is beyond 3000 1/mm. It is indicated in Fig. 1 obtained with scanfling tunnel microscope. The resolution of the relief shown in the picture equals 3600 1/mm. It can be seen that at such values of resolution the obtained relief is distorted thus implying that the use of
© (1991) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Igor Y. Yusupov, Mikhail D. Mikhailov, Rudolf Herke, Leonid I. Goray, S. B. Mamedov, and O. A. Yakovuk "Investigation of the arsenic sulphide films for relief-phase holograms", Proc. SPIE 1238, Three-Dimensional Holography: Science, Culture, Education, (1 February 1991);

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