Large-area scatterometry for nanoscale metrology

Jaime Gómez Rivas; Mohammad Ramezani; Marc Verschuuren; Gabriel Castellanos

doi:10.1117/12.2649342

15 March 2023 Large-area scatterometry for nanoscale metrology

Jaime Gómez Rivas, Mohammad Ramezani, Marc Verschuuren, Gabriel Castellanos

Proceedings Volume 12433, Advanced Fabrication Technologies for Micro/Nano Optics and Photonics XVI; 124330I (2023) https://doi.org/10.1117/12.2649342
Event: SPIE OPTO, 2023, San Francisco, California, United States

Conference Poster

Abstract

Many applications across photonics and semiconductor industries require the fabrication of nanostructures with non-trivial geometries with a precision and reproducibility down to the nanometer scale. Slanted gratings and metamaterials are examples of such designs that have vast applications in Augmented Reality and LiDAR. State-of-the-art lithography techniques, such as nanoimprint lithography or UV lithography, can provide such levels of fabrication precision for high-volume production. However, a rapid in-line quality inspection method for such complex patterns is required to monitor the fabrication process, verify the sample quality, and to ensure reproducibility. Here, we demonstrate a novel technique that allows us to inspect the quality of the samples in a non-destructive and fast manner, and to extract geometrical parameters of the nanostructures over large areas, generating spatial variations maps across wafers.

Citation Download Citation

Jaime Gómez Rivas, Mohammad Ramezani, Marc Verschuuren, and Gabriel Castellanos "Large-area scatterometry for nanoscale metrology", Proc. SPIE 12433, Advanced Fabrication Technologies for Micro/Nano Optics and Photonics XVI, 124330I (15 March 2023); https://doi.org/10.1117/12.2649342

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