Dry film holographic grating based on computer-generated mask lithography

Chanikan Inneam; S. Tipawan Khlayboonme; Mettaya Kitiwan; Witoon Yindeesuk; Keerayoot Srinuanjan

doi:10.1117/12.2658775

8 December 2022 Dry film holographic grating based on computer-generated mask lithography

Chanikan Inneam, S. Tipawan Khlayboonme, Mettaya Kitiwan, Witoon Yindeesuk, Keerayoot Srinuanjan

Proceedings Volume 12479, Optical Manipulation and Structured Materials Conference (OMC 2022); 1247904 (2022) https://doi.org/10.1117/12.2658775
Event: Optics and Photonics International Congress, 2022, Yokohama, Japan

Abstract

This paper presented an alternative technique for fabricating the dry film holographic grating based on a mask generated by computer simulation and experimental results. The mask was generated by a fringe pattern which is created by the mathematical model of two beams interference with various angles. Computer simulation of the fringe pattern was printed on film, i.e., the holographic grating mask. The mask was attached on dry film and then illuminated by UV light, where the lithography technique was applied. According to the lithography technique, the computer-generated holographic grating mask was transferred to dry film. After fabrication, fringe patterns obtained from the grating were observed. Then, the grating period was analyzed and confirmed by Scanning Electron Microscope (SEM). Experimental results show that the method could apply to fabricate the dry film holographic grating.

Citation Download Citation

Chanikan Inneam, S. Tipawan Khlayboonme, Mettaya Kitiwan, Witoon Yindeesuk, and Keerayoot Srinuanjan "Dry film holographic grating based on computer-generated mask lithography", Proc. SPIE 12479, Optical Manipulation and Structured Materials Conference (OMC 2022), 1247904 (8 December 2022); https://doi.org/10.1117/12.2658775

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KEYWORDS

Holography

Photomasks

Lithography

Computer simulations

Scanning electron microscopy

Fringe analysis

Diffraction gratings

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