Presentation + Paper
28 April 2023 Structured assist features in inverse lithography
Author Affiliations +
Abstract
The original inverse lithography technology (ILT) commitment of creating a free-form mask from ex nihilo underwent transformation under pressure of constraints that are imposed by the capabilities of manufacturing and inspection equipment. This pressure became especially noticeable in the dealing with sub-resolution assist features (SRAF). The freeform SRAFs are naturally unmanufacturable and hard to inspect. In addition to this complication, the ILT signal for SRAFs is substantially weaker and often ill-defined in comparison to a strong signal from fidelity objectives to print main features on target. So, it is difficult to automatically produce SRAFs that are simultaneously geometrically stable, do not print, MRC-clean, and deliver the best lithographic quality. To overcome these obstacles, we propose new concept of structured SRAFs by combining ILT ideas with robust geometrical parameterization to introduce well-behaved and MRC-clean by construction mask decorations.
Conference Presentation
© (2023) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Yuri Granik and Philip Wang "Structured assist features in inverse lithography", Proc. SPIE 12495, DTCO and Computational Patterning II, 1249504 (28 April 2023); https://doi.org/10.1117/12.2658771
Advertisement
Advertisement
RIGHTS & PERMISSIONS
Get copyright permission  Get copyright permission on Copyright Marketplace
KEYWORDS
SRAF

Lithography

Printing

Photomasks

Optical proximity correction

Manufacturing

Photovoltaics

Back to Top