Curvilinear mask: bridging ILT to HVM

Danping Peng; Shang-Jung Wu; Jue-Chin Yu; Chia-Hua Chang; Kenneth Ho

doi:10.1117/12.2661726

30 April 2023 Curvilinear mask: bridging ILT to HVM

Danping Peng, Shang-Jung Wu, Jue-Chin Yu, Chia-Hua Chang, Kenneth Ho

Proceedings Volume 12495, DTCO and Computational Patterning II; 124950I (2023) https://doi.org/10.1117/12.2661726
Event: SPIE Advanced Lithography + Patterning, 2023, San Jose, California, United States

Abstract

Free-form ILT has the best lithography quality but suffers long runtime and large file sizes. The shortcomings can be mitigated by using spline-polygon curvilinear mask. Further more curvilinear OPC can be used to drive down the EPE, further improving the runtime and correction quality

Conference Presentation

Citation Download Citation

Danping Peng, Shang-Jung Wu, Jue-Chin Yu, Chia-Hua Chang, and Kenneth Ho "Curvilinear mask: bridging ILT to HVM", Proc. SPIE 12495, DTCO and Computational Patterning II, 124950I (30 April 2023); https://doi.org/10.1117/12.2661726

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available