OPO robustness and measurability improvement via extended wavelengths

Shlomit Katz; Nikhil Aditya Kumar Roy; Steve McCandless; Jason Reece; Nathan Gillespie; Nils Monserud; Yoav Grauer; Mark Stakely; Greg Gray; Yonglei Li; Peter Kimani; Nahee Park; Iwata Yasuhisa; Imura Koichi; Ito Kosuke; Yuqian Zhang

doi:10.1117/12.2655161

27 April 2023 OPO robustness and measurability improvement via extended wavelengths

Shlomit Katz, Nikhil Aditya Kumar Roy, Steve McCandless, Jason Reece, Nathan Gillespie, Nils Monserud, Yoav Grauer, Mark Stakely, Greg Gray, Yonglei Li, Peter Kimani, Nahee Park, Iwata Yasuhisa, Imura Koichi, Ito Kosuke, Yuqian Zhang

Author Affiliations +

Proceedings Volume 12496, Metrology, Inspection, and Process Control XXXVII; 1249613 (2023) https://doi.org/10.1117/12.2655161
Event: SPIE Advanced Lithography + Patterning, 2023, San Jose, California, United States

Conference Poster

Abstract

The semiconductor industry continually evaluates new materials to improve the process or minimize product variability, which could create measurement challenges for metrology tools in the visible and near-infrared (NIR) spectrum. Opaque materials (i.e., ‘hard masks,’ ‘HM’) are placed in between the resist (i.e., inner layer) and process (i.e., outer layer or underlying layer) in 3D NAND or DRAM processes to control the etch of high aspect-ratio structures to maximize product yield. However, longer wavelengths (e.g., IR WL) may be required to penetrate and properly view the underlying process layer and measure OVL accurately. In this work, longer wavelengths will be evaluated to improve measurement accuracy and keep up with the increasing use of opaque materials, which is expected to increase in future nodes. We will review the benefits of IR WL to OVL measurement accuracy by quantifying the OVL residuals, contrast precision (CP), and total measurement uncertainty (TMU) on multiple DRAM and 3D NAND critical layers.

Conference Presentation

Citation Download Citation

Shlomit Katz, Nikhil Aditya Kumar Roy, Steve McCandless, Jason Reece, Nathan Gillespie, Nils Monserud, Yoav Grauer, Mark Stakely, Greg Gray, Yonglei Li, Peter Kimani, Nahee Park, Iwata Yasuhisa, Imura Koichi, Ito Kosuke, and Yuqian Zhang "OPO robustness and measurability improvement via extended wavelengths", Proc. SPIE 12496, Metrology, Inspection, and Process Control XXXVII, 1249613 (27 April 2023); https://doi.org/10.1117/12.2655161

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