1 June 1990 Certain linewidth measurements
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As feature sizes get smaller the error of measurement must also become smaller. An adequate sub-micron measurement must be correct, within a certain or determined error limit. The error limit for a metrology instrument designed for use on sub-micron features in a production environment, the Opal 702, was investigated experimentally. There are numerous contributors to Iinewidth measurement uncertainty; (1) Dynamic Precision (including wafer and system variations), (2) system Stability (determined in a way to avoid including wafer stability), and (3) Offset (dependent on signal interpretation or algorithm) [1]. In a practical way all these variables are incorporated in (4) Dynamic Uncertainty.
© (1990) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Karl L. Harris, Karl L. Harris, Israel Nadler Niv, Israel Nadler Niv, Dorron D. Levy, Dorron D. Levy, "Certain linewidth measurements", Proc. SPIE 1261, Integrated Circuit Metrology, Inspection, and Process Control IV, (1 June 1990); doi: 10.1117/12.20028; https://doi.org/10.1117/12.20028

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