The Laser Interferometric X-Y Measuring System Model XY-21 has been used
around the world for many years as the standard machine of measuring coordinate
of reticles and masks for IC and LSI. However, indications are that the
capability of the XY-2I may not be sufficient to match the ever increasing
trend toward ultra large scale integration (ULSI).
In response, we have recently developed a successor to the XY-2I,the Laser
Interferometric X-Y Measuring System Model XY-3I. The new system is designed to
meet the requirements of the ULSI era.
The XY-3I enables very accurate, full automatic measurement of pattern
coordinate on masks and reticles, as well as the critical dimension (CD). The
system can handle the patterns on the wafers equally well, with the
capabilities of highly accurate measurement of coordinate position, CD and
overlay registration of pattern. An additional feature of the XY-3I is bow
compensation, which decreases fluctuation among measurement data due to bow
change of sample.
This paper presents the improvements, new functions, performance and
applications of the XY-.3I.