1 June 1990 Impact of reticle defects on submicron 5x lithography
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During past years a lot of efforts were put from several authors in order to approach the problems related to reticle defect printability. Several works analized the physical phenomena affecting the mask imperfection reproducibility and recently it was showed that the impact of reticle defects eeems to increase by going from micron to submicron lithography. The goal at the base of the present work has been to verify these hypothesis by starting from the experience collected in the previous works and by designing targeted experiments in order to classify the real critical impact of the possible important factors.
© (1990) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Paolo Canestrari, Paolo Canestrari, Samuele Carrera, Samuele Carrera, Giorgio A. L. M. Degiorgis, Giorgio A. L. M. Degiorgis, Vito Visentini, Vito Visentini, } "Impact of reticle defects on submicron 5x lithography", Proc. SPIE 1261, Integrated Circuit Metrology, Inspection, and Process Control IV, (1 June 1990); doi: 10.1117/12.20049; https://doi.org/10.1117/12.20049

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