1 June 1990 Large-bandwidth deep-UV microscopy for CD metrology
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Abstract
To adress the problems encountered when measuring subinicrons CD patterns with white light microscopy, an instrument using the ultraviolet spectrum around 280 urn has been designed and tested. The technologies developped for dealing simultaneously with ultraviolet, visible and infrared light are pnsented. The main advantage lies in the absorbance ofphotonsists, leading to simple optical proffles. Theontical results obtained with a modelling approach are iepoited along with experimental results characterized with respect to SEM cross sections.
© (1990) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Olivier Hignette, Janusz Woch, Laurence Gotti, "Large-bandwidth deep-UV microscopy for CD metrology", Proc. SPIE 1261, Integrated Circuit Metrology, Inspection, and Process Control IV, (1 June 1990); doi: 10.1117/12.20036; https://doi.org/10.1117/12.20036
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