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1 June 1990 Nonlinear adaptive edge-detection techniques for wafer inspection and alignment
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In this paper we present a class of nonlinear adaptive filtering schemes to detect edges to the nearest pixel in digital images. These one- or two-dimensional filters are adapted by training to a subset of image data to produce peaked output at user-specified edge locations within the image. A nonlinear adaptive algorithm has been developed and has shown improved performance over standard cross correlation schemes in binary classification situations. The resulting filters are then applied non-adaptively to the entire image set, and signal peaks within the image are detected to produce a binary edge map. A short theoretical development of the algorithm is given, and results for images representative of harsh alignment conditions are presented.
© (1990) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Scott C. Douglas, Teresa H.-Y. Meng, and Roger Fabian W. Pease "Nonlinear adaptive edge-detection techniques for wafer inspection and alignment", Proc. SPIE 1261, Integrated Circuit Metrology, Inspection, and Process Control IV, (1 June 1990);

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