1 June 1990 Practical photomask linewidth measurements
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Abstract
The measurement cycle for practical accurate photomask linewidth measurements is analyzed as a differential measurement- -the linewidth to be measured is compared to a known linewidth on a standard photomask. The linewidth measuring instrument is thus a comparator. The conditions necessary for a valid measurement are discussed with regard to both the instrument and the comparison process. The principles discussed here apply to many other types of measurement as well.
© (1990) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
James E. Potzick, James E. Potzick, } "Practical photomask linewidth measurements", Proc. SPIE 1261, Integrated Circuit Metrology, Inspection, and Process Control IV, (1 June 1990); doi: 10.1117/12.20039; https://doi.org/10.1117/12.20039
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