1 June 1990 Practical photomask linewidth measurements
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Abstract
The measurement cycle for practical accurate photomask linewidth measurements is analyzed as a differential measurement- -the linewidth to be measured is compared to a known linewidth on a standard photomask. The linewidth measuring instrument is thus a comparator. The conditions necessary for a valid measurement are discussed with regard to both the instrument and the comparison process. The principles discussed here apply to many other types of measurement as well.
© (1990) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
James E. Potzick, James E. Potzick, "Practical photomask linewidth measurements", Proc. SPIE 1261, Integrated Circuit Metrology, Inspection, and Process Control IV, (1 June 1990); doi: 10.1117/12.20039; https://doi.org/10.1117/12.20039
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