Non-integral model-based scatterometry for single-structure OCD metrology

Wei-Hsin Chein; Fu-Sheng Yang; Zi-Ying Fu; Liang-Chia Chen

doi:10.1117/12.2673318

10 August 2023 Non-integral model-based scatterometry for single-structure OCD metrology

Wei-Hsin Chein, Fu-Sheng Yang, Zi-Ying Fu, Liang-Chia Chen

Proceedings Volume 12619, Modeling Aspects in Optical Metrology IX; 126190H (2023) https://doi.org/10.1117/12.2673318
Event: SPIE Optical Metrology, 2023, Munich, Germany

Abstract

A new non-integral optical scatterometry technique has been introduced to circumvent issues with traditional methods in the critical dimension (CD) characterization of micro and nano-structures in semiconductor inspections. This method uses the high spatial coherence of the laser source, and an adjustable numerical aperture (NA) for effective beam shaping, enabling precise measurement of high-aspect-ratio structures. It incorporates a model-based approach with a virtual optical system and the Finite- Difference Time-Domain (FDTD) method for multiple CD characterizations, improving measurement precision. Early tests indicate a minimal average bias of 1.74% from calibrated references and standard deviations within 7 nm.

Conference Presentation

Citation Download Citation

Wei-Hsin Chein, Fu-Sheng Yang, Zi-Ying Fu, and Liang-Chia Chen "Non-integral model-based scatterometry for single-structure OCD metrology", Proc. SPIE 12619, Modeling Aspects in Optical Metrology IX, 126190H (10 August 2023); https://doi.org/10.1117/12.2673318

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