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Systematic investigation of the photoresponse and dissolution characteristics of an acid-hardening resist
Novolac design for high-resolution positive photoresist (III): a selection principle of phenolic compounds for novolac resins
Studies of the molecular mechanism of dissolution inhibition of positive photoresists based on novolac-DNQ
High-resolution positive photoresists: novolac molecular weight and molecular weight distribution effects
Chemical amplification of resist lines: a novel sub-half-micron bilayer resist tehnique for NUV and deep-UV lithography
Improved CD uniformity as a function of developer chemistry and process parameters derived from a statistically designed experiment
Image formation mechanism in PMMA-MAA antracene positive photoresist exposed by pulsed laser and kinetics of its development