1 June 1990 Application of the in-situ dyeing effect for an image reversal resist
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Abstract
The dyeing effect observed at an image reversal resist, are explained using tTh-Vis spectropbotanetry , and on that basis, the canputations of A , B, C and y values used in SAMPLE simulations prove the lithographic properties of this technique.
© (1990) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Dan V. Nicolau, Mircea V. Dusa, "Application of the in-situ dyeing effect for an image reversal resist", Proc. SPIE 1262, Advances in Resist Technology and Processing VII, (1 June 1990); doi: 10.1117/12.20110; https://doi.org/10.1117/12.20110
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