1 June 1990 Characteristics of new KrF excimer laser resist
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New alkali-soluble polymer which is highly transparent at 248nm were prepared. Alkali-dissolution rate, optical transmission at 248nm and RIE resistance of the polymer were studied. As a sensitizer, diazoketone compounds were newly synthesized and provided an intense bleachable absorbance at 248nm. The new KrF excimer laser positive resist (NEX) composed of the diazoketone as the sensitizer and the maleimide copolymer as the base polymer has been developed.
© (1990) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Takeshi Kotani, Takeshi Kotani, Mitsuhiko Sano, Mitsuhiko Sano, Kei-ichi Hayashi, Kei-ichi Hayashi, Hideo Kikuchi, Hideo Kikuchi, } "Characteristics of new KrF excimer laser resist", Proc. SPIE 1262, Advances in Resist Technology and Processing VII, (1 June 1990); doi: 10.1117/12.20101; https://doi.org/10.1117/12.20101

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