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1 June 1990 Effect of 2,1,4 DAQ ester chemistry on the behavior of I-line image reversal resists
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This paper studies the etiemistry of image reversal (1R) systems based on 2,1,4- diazoquinone substituted trihydroxybenzophenone (THBP) , tetrahydroxybenzophenone (tetra-HBP), p-cumylphenol (PCP) and novolac resins (N). Results are investigated in depth as to their impact on the functional behavior of the IR resist. Both cross-linking and decarboxylation modes are studied , as they relate to energy to clear. It is shown that using cross-linking systems based on the above DAQ esters, a m/p novolac, and a bifunctional cross-linking agent of the type '2 wherein X = OH, the broadband energy required to effect cross-linking decreases in the order of PCP > N > tetra-HBP > THBP. The concentration of the afore- mentioned sensitizers was in all cases equimolar in terms of diazo content. Surprisingly, in decarboxylation IR, the exposure energy required to effect decarboxylation decreases in the order of tetra-HBP > THBP > N > PCP, essentially a complete reversal as compared with cross-linking type IR.
© (1990) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
John J. Grunwald, Chava Gal, and Sigalit Eidelman "Effect of 2,1,4 DAQ ester chemistry on the behavior of I-line image reversal resists", Proc. SPIE 1262, Advances in Resist Technology and Processing VII, (1 June 1990);


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