G-line image reversal: capabilities on a 0.54-N.A. stepper

Thomas R. Seha; Thiloma Perera

doi:10.1117/12.20118

1 June 1990 G-line image reversal: capabilities on a 0.54-N.A. stepper

Thomas R. Seha, Thiloma Perera

Proceedings Volume 1262, Advances in Resist Technology and Processing VII; (1990) https://doi.org/10.1117/12.20118
Event: Microlithography '90, 1990, San Jose, CA, United States

Abstract

During the last several years image reversal has been demonstrated to be an effective technique for extending theresolution ofoptical steppers while maintaining therelative simplicity of single layerresist processing13. In order to satisfy the increasing requirements for smaller device geometries very high numerical aperture g-line steppers have lately become available. A new image reversal resist (Raypo) designed specifically for g-line use has recently been developed by Hoechst corporation4. This paper discusses the process optimization andlithographic performance ofthis resist on a 0.54 N.A. stepper, one ofthe highest numerical aperture g-line steppers currently available. The process variables investigated include prebake temperature, post exposure bake temperature, flood exposure time, and develop conditions. The responses studied include resolution capability, profile quality, dose requirements, exposure latitude, focus latitude, and performance on reflective topography. The thermal stability of the resist is also discussed. Some results are compared with those for a new advancedpositive g-line resist (AZ 6212) developed by Hoechst corporation.

Citation Download Citation

Thomas R. Seha and Thiloma Perera "G-line image reversal: capabilities on a 0.54-N.A. stepper", Proc. SPIE 1262, Advances in Resist Technology and Processing VII, (1 June 1990); https://doi.org/10.1117/12.20118

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