Paper
1 June 1990 I-line photolithography: an investigation of resist bleachability and process performance
Giorgio A. L. M. Degiorgis, Patrizia Pateri, Alberto Pilenga, Rodney J. Hurditch, Bernard T. Beauchemin Jr., Edward A. Fitzgerald III
Author Affiliations +
Abstract
The present work presents an investigation of the characteristics of a broad band capability photoresist in terms of photo-active compound (PAC) bleachability and process performances. The difference in performance on exposure to 436 and 365 nm wavelengths of a commercially available photoresist, Olin Hunt H1PR-6512, has been evaluated as a function of some typical lithographic parameters by using FT-IR spectroscopy and actinometry. This analysis contributed to the development of a submicron I-line process, which in conclusion is shown in a production environment application.
© (1990) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Giorgio A. L. M. Degiorgis, Patrizia Pateri, Alberto Pilenga, Rodney J. Hurditch, Bernard T. Beauchemin Jr., and Edward A. Fitzgerald III "I-line photolithography: an investigation of resist bleachability and process performance", Proc. SPIE 1262, Advances in Resist Technology and Processing VII, (1 June 1990); https://doi.org/10.1117/12.20129
Advertisement
Advertisement
RIGHTS & PERMISSIONS
Get copyright permission  Get copyright permission on Copyright Marketplace
KEYWORDS
Picture Archiving and Communication System

Photoresist processing

Absorbance

FT-IR spectroscopy

Reflectivity

Quantum efficiency

Lithography

RELATED CONTENT

Practical I-Line Lithography
Proceedings of SPIE (August 20 1986)
Solvent content of thick photoresist films
Proceedings of SPIE (June 23 2000)
Unique spin coat process for positive photoresists
Proceedings of SPIE (June 09 1995)
TAR processing for CD control in I line and 248...
Proceedings of SPIE (August 08 1993)

Back to Top