1 June 1990 Image reversal: a new chemical approach using isoureas
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Abstract
A dual-tone photoresist that produces positive and negative images has been developed. The chemistry of image reversal is based on novolac-bound isoureas. Isoureas are "blocked" carbodiimides which deblock during postbake to deactivate indenecarboxylic acid groups in the irradiated areas. After postbake, the resist is flood-exposed to convert the remaining photoactive compound in the resist to indenecarboxylic acid groups; development then gives a negative image of the mask.
© (1990) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
James W. Taylor, Thomas L. Brown, David R. Bassett, "Image reversal: a new chemical approach using isoureas", Proc. SPIE 1262, Advances in Resist Technology and Processing VII, (1 June 1990); doi: 10.1117/12.20107; https://doi.org/10.1117/12.20107
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