1 June 1990 Microlithography using conducting polymers
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Abstract
Lithographically structured electrically conducting polymers can be otained via photoexposure of precomposites, consisting of a matrix polymer and a photosensitive oxidant. Upon the selective destruction of the oxidant, the remaining oxidant can be used to convert a suitable monomer from its vapor phase into a lithographically patterned, electrically conducting polymer. This two-dimensional pattern can be converted into a three-dimensional pattern either via selective RIE or via electroplating a metal or other conducting material on top of the above composite. In a typical example the matrix polymer is PVC, pyrrole saves as the monomer, FeC13 as the photosensitive oxidant and copper is being electroplated onto the polypyrrole pattern.
© (1990) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Joachim Bargon, Joachim Bargon, Theo Weidenbrueck, Theo Weidenbrueck, Takumi Ueno, Takumi Ueno, } "Microlithography using conducting polymers", Proc. SPIE 1262, Advances in Resist Technology and Processing VII, (1 June 1990); doi: 10.1117/12.20109; https://doi.org/10.1117/12.20109
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