1 June 1990 Negative tone aqueous developable resist for photon, electron, and x-ray lithography
Author Affiliations +
Abstract
The use of negative acting photoresists has become a integral part of device fabrication strategy. In this paper we will. discuss a phenolic based photoresist which incorporates a crosslinkable resin and an acid generating sensitizer. When exposed and thermally treated, the resist forms a negative tone image which is developable in an alkaline medium. We will discuss the materials, processes and results from photon, electron and X-ray lithographic evaluations.
© (1990) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Will Conley, Will Conley, Wayne M. Moreau, Wayne M. Moreau, Stanley Perreault, Stanley Perreault, Gary T. Spinillo, Gary T. Spinillo, Robert L. Wood, Robert L. Wood, Jeffrey D. Gelorme, Jeffrey D. Gelorme, Ronald M. Martino, Ronald M. Martino, } "Negative tone aqueous developable resist for photon, electron, and x-ray lithography", Proc. SPIE 1262, Advances in Resist Technology and Processing VII, (1 June 1990); doi: 10.1117/12.20087; https://doi.org/10.1117/12.20087
PROCEEDINGS
11 PAGES


SHARE
RELATED CONTENT

Design of soft x ray varied line spacing grating based...
Proceedings of SPIE (October 30 2016)
Transition Radiation As An X-Ray Source For Lithography
Proceedings of SPIE (June 29 1987)
X-Ray Lithography: Can It Be Justified
Proceedings of SPIE (June 19 1985)
SOR Lithography in West Germany
Proceedings of SPIE (July 31 1989)
Sophisticated masks
Proceedings of SPIE (February 28 1991)

Back to Top