1 June 1990 Photoresist aerosol particle formation during spin coating
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Aerosol photoresist particles, that formed during spin-coating of silicon wafers, were contained by modifying the spin-cup of a photorésist coater. The aerosol particles were counted, using an optical particle counter, and collected for SEM inspection with a cascade particle inipactor. We measured the effect spin-coating process variables had on the nuniber, size and shape of photoresist aerosol particles. Both negative and positive photoresist coatings, having photoresist aerosol particles on their surfaces, were exposed and developed to demonstrate the type of pattern defects that fornied.
© (1990) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
L. David Pratt, L. David Pratt, } "Photoresist aerosol particle formation during spin coating", Proc. SPIE 1262, Advances in Resist Technology and Processing VII, (1 June 1990); doi: 10.1117/12.20111; https://doi.org/10.1117/12.20111

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