1 June 1990 Studies of the molecular mechanism of dissolution inhibition of positive photoresists based on novolac-DNQ
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Abstract
effects in the development process. A comprehensive theory ofdissolution inhibition in novolak-DNQ (diazonaphthoquinone) resist is proposed, which is based on experimental studies of novolak-PAC (photoactive compound) interactions and the relationship between novolak microstructres and dissolution inhibition. The theory invokes a "two-step mechanism". Static molecular interactions between novolak and DNQ are augmented by secondary dynamic
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Kenji Honda, Bernard T. Beauchemin, Rodney J. Hurditch, Andrew J. Blakeney, Yasumasa Kawabe, Tadayoshi Kokubo, "Studies of the molecular mechanism of dissolution inhibition of positive photoresists based on novolac-DNQ", Proc. SPIE 1262, Advances in Resist Technology and Processing VII, (1 June 1990); doi: 10.1117/12.20104; https://doi.org/10.1117/12.20104
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