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1 May 1990 Development of radiation-cooled slotted rotating target x-ray source (III)
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The design concept on X-ray lithography system using the X-ray source with an ebeam excited rotating target has been presented in the previous reportsl The X-ray source is developed to fit the laboratory and test productive use for the microlithography applied to O.25iim feature size. The e-beam focus diameter of 3mm at the power of 3kW to generate characteristic X-ray of 4.4A(Pd:Lc) wave length has been recently obtained, though it is not satisfactory as compared with the desired value of 1mm at the power of 10kW. The fundamental data for this experiment such as the vibration severity with the rotation of cooling fins, the temperature rise of the target and the maximum voltage of e-beam without a discharge are discussed. These show that the system will satisfy a stable structure and cooling capacity enough to step up the e-beam power and to reduce the spot size of e-beam.
© (1990) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Motomu Asano, Takashi Tagawa, Hideshi Yoshikawa, and Shuzo Hattori "Development of radiation-cooled slotted rotating target x-ray source (III)", Proc. SPIE 1263, Electron-Beam, X-Ray, and Ion-Beam Technology: Submicrometer Lithographies IX, (1 May 1990);

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