1 May 1990 Target x-ray source lithography and photolithography mixed and match system
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Target X-ray source lithography and photo lithography mixed and match system was proposed for an effective lithography system. The key technology for the system is a projection moire alignment, whose marks are used for both photo and X-ray lithography. In order to realize the systeimi, related technologies and apparatus are developing, which are photo and X-ray stepper, Xray source of radiation cooled slotted Pd target, X-ray mask and X-ray mask inspection system.
© (1990) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Shuzo Hattori, Shinzo Morita, Akihiro Yoshida, Tsutomu Nomura, Takashi Tagawa, Hideshi Yoshikawa, "Target x-ray source lithography and photolithography mixed and match system", Proc. SPIE 1263, Electron-Beam, X-Ray, and Ion-Beam Technology: Submicrometer Lithographies IX, (1 May 1990); doi: 10.1117/12.20150; https://doi.org/10.1117/12.20150


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