Target x-ray source lithography and photolithography mixed and match system

Shuzo Hattori; Shinzo Morita; Akihiro Yoshida; Tsutomu Nomura; Takashi Tagawa; Hideshi Yoshikawa

doi:10.1117/12.20150

1 May 1990 Target x-ray source lithography and photolithography mixed and match system

Shuzo Hattori, Shinzo Morita, Akihiro Yoshida, Tsutomu Nomura, Takashi Tagawa, Hideshi Yoshikawa

Proceedings Volume 1263, Electron-Beam, X-Ray, and Ion-Beam Technology: Submicrometer Lithographies IX; (1990) https://doi.org/10.1117/12.20150
Event: Microlithography '90, 1990, San Jose, CA, United States

Abstract

Target X-ray source lithography and photo lithography mixed and match system was proposed for an effective lithography system. The key technology for the system is a projection moire alignment, whose marks are used for both photo and X-ray lithography. In order to realize the systeimi, related technologies and apparatus are developing, which are photo and X-ray stepper, Xray source of radiation cooled slotted Pd target, X-ray mask and X-ray mask inspection system.

Citation Download Citation

Shuzo Hattori, Shinzo Morita, Akihiro Yoshida, Tsutomu Nomura, Takashi Tagawa, and Hideshi Yoshikawa "Target x-ray source lithography and photolithography mixed and match system", Proc. SPIE 1263, Electron-Beam, X-Ray, and Ion-Beam Technology: Submicrometer Lithographies IX, (1 May 1990); https://doi.org/10.1117/12.20150

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available