1 June 1990 Comprehensive 3-D notching simulator with nonplanar substrates
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Abstract
A comprehensive three-dimensional simulation model for non-planar substrate lithography is presented. Matching substrate as well as standing wave effects are examined. The projection printing is simulated using Hopkins'' results and the exposure model is solved using spectral element discretizations of the nonlinear wave equation coupled with the rate equation for the photoactive compound concentrate evolution. The dissolution algorithm describing moving fronts has been modified to handle various topographies thus yielding the final profiles. Results are presented for several test problems. 1.
© (1990) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Eytan Barouch, Eytan Barouch, Brian D. Bradie, Brian D. Bradie, Uwe Hollerbach, Uwe Hollerbach, George Karniadakis, George Karniadakis, Steven A. Orszag, Steven A. Orszag, } "Comprehensive 3-D notching simulator with nonplanar substrates", Proc. SPIE 1264, Optical/Laser Microlithography III, (1 June 1990); doi: 10.1117/12.20198; https://doi.org/10.1117/12.20198
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