Design and performance of a production-oriented deep-UV wafer stepper

Richard F. Hollman; Frederick Cleveland; Elvino M. Da Silveira; Roger W. McCleary; Robert W. Strauten

doi:10.1117/12.20208

1 June 1990 Design and performance of a production-oriented deep-UV wafer stepper

Richard F. Hollman, Frederick Cleveland, Elvino M. Da Silveira, Roger W. McCleary, Robert W. Strauten

Proceedings Volume 1264, Optical/Laser Microlithography III; (1990) https://doi.org/10.1117/12.20208
Event: Microlithography '90, 1990, San Jose, CA, United States

Abstract

Significant advaixements sire the deliveiy of the AWLS stepper in 1987 have led to the introduction of a true production-oriented excimer laser stepper. T1 Laserstep 200 system a third generation deep IN stepper benefits from imprcwements in 248nm projection lenses and from t1 availability of more powerful reliable and fully integrated excimer lasers designed for lithography use. The design of the Laserstep system overcomes previous limitations in performance associated with tl use of pulsed 248nm KrF laser illumination. Waferless automated system calibration features previously developed for GCA g-line and i-linc systems have been adapted to function with a pulsed excimer laser source. These features maintain tl instrument in a production-qualified state while also prwiding valuable statistical process control data. Ikse control of 1 is achieved with exposures well under 200 msec allowing high throughput on the sensitive deep UV resists becoming available. 1.

Citation Download Citation

Richard F. Hollman, Frederick Cleveland, Elvino M. Da Silveira, Roger W. McCleary, and Robert W. Strauten "Design and performance of a production-oriented deep-UV wafer stepper", Proc. SPIE 1264, Optical/Laser Microlithography III, (1 June 1990); https://doi.org/10.1117/12.20208

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