1 June 1990 Image quality of higher NA I-line projection lens
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Abstract
These days much attention is being paid to the potential of i-line lithography. We have manufactured a high numer ical aperture ( N. A. ) i-lme lens in order to study this potential. The lens specification is as follows magnification : 1/10 N. A. : 0. 65 field size : 5X5min. In this paper we first compare the difference between the image quality of g-line and i-line optics with the same resolution and then we present the results of our experiment with the new i-line lens which shows the considerable P055 ibil ity of sub-half micron 1 ithography with an i-l me optical stepper. 1.
© (1990) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Shinichi Nakamura, Shinichi Nakamura, Koichi Matsumoto, Koichi Matsumoto, Kazuo Ushida, Kazuo Ushida, Masaomi Kameyama, Masaomi Kameyama, } "Image quality of higher NA I-line projection lens", Proc. SPIE 1264, Optical/Laser Microlithography III, (1 June 1990); doi: 10.1117/12.20181; https://doi.org/10.1117/12.20181
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