1 June 1990 Modeling latent image formation in photolithography using the Helmholtz equation
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A novel method for simulating latent image formation in a photoresist illuminated by partially coherent light is described. Starting with an accurate procedure for discretizing the extended incoherent light source into sufficiently many point sources the fields incident on the resist corresponding to these sources are calculated. Then the latent image is calculated by repeatedly solving a boundary value problem for the Helmholtz equation using the finite element method. The characteristics of this method which is particularly suitable for the simulation of bumpy interfaces are discussed. The dependence of developed image on defocus is then investigated for the case of high NA. The obtained results are compared with those predicted by the vertical propagation and the first order models. The applicability of the method to bumpy layers is also illustrated. 1.
© (1990) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
H. Paul Urbach, H. Paul Urbach, Douglas A. Bernard, Douglas A. Bernard, "Modeling latent image formation in photolithography using the Helmholtz equation", Proc. SPIE 1264, Optical/Laser Microlithography III, (1 June 1990); doi: 10.1117/12.20211; https://doi.org/10.1117/12.20211

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