Optimal binary image design for optical lithography

Yong Liu; Avideh Zakhor

doi:10.1117/12.20216

1 June 1990 Optimal binary image design for optical lithography

Yong Liu; Avideh Zakhor

Author Affiliations +

Proceedings Volume 1264, Optical/Laser Microlithography III; (1990) https://doi.org/10.1117/12.20216
Event: Microlithography '90, 1990, San Jose, CA, United States

Abstract

we apply combinatorial optimization techniques to binary mask design for optical lithography. The mask is optimized in such a way as to pre-compensate the distortions due to diffraction of the optical system. Mean squared error (MSE) criterion is used to formulate the problem as a binary linear programming (LP) one which is then solved via branch and bound and simplex algorithms. Variation of the optimal mask as a function of the optical system bandwidth is discussed. Examples involving corners squares bars and crosses are presented. 1.

Citation Download Citation

Yong Liu, Yong Liu, Avideh Zakhor, Avideh Zakhor, } "Optimal binary image design for optical lithography", Proc. SPIE 1264, Optical/Laser Microlithography III, (1 June 1990); doi: 10.1117/12.20216; https://doi.org/10.1117/12.20216

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