Optimal binary image design for optical lithography

Yong Liu; Avideh Zakhor

doi:10.1117/12.20216

1 June 1990 Optimal binary image design for optical lithography

Yong Liu; Avideh Zakhor

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Proceedings Volume 1264, Optical/Laser Microlithography III; (1990) https://doi.org/10.1117/12.20216
Event: Microlithography '90, 1990, San Jose, CA, United States

Abstract

we apply combinatorial optimization techniques to binary mask design for optical lithography. The mask is optimized in such a way as to pre-compensate the distortions due to diffraction of the optical system. Mean squared error (MSE) criterion is used to formulate the problem as a binary linear programming (LP) one which is then solved via branch and bound and simplex algorithms. Variation of the optimal mask as a function of the optical system bandwidth is discussed. Examples involving corners squares bars and crosses are presented. 1.

Citation Download Citation

Yong Liu, Avideh Zakhor, "Optimal binary image design for optical lithography", Proc. SPIE 1264, Optical/Laser Microlithography III, (1 June 1990); doi: 10.1117/12.20216; https://doi.org/10.1117/12.20216

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