In-situ film thickness monitoring in CVD and other thin film deposition processes

Piet J. Severin

doi:10.1117/12.20267

1 August 1990 In-situ film thickness monitoring in CVD and other thin-film deposition processes

Piet J. Severin

Proceedings Volume 1266, In-Process Optical Measurements and Industrial Methods; (1990) https://doi.org/10.1117/12.20267
Event: The International Congress on Optical Science and Engineering, 1990, The Hague, Netherlands

Abstract

An optical-fibre sensor based on the phase of the signal reflected from a stack of 5i02/Si3N4 layers grown on silica in LPCVD is described in detail. This sensor is an example of a rather straightforward embodiment within the wide range of possible reflection-based optical fibre sensors. The various options allowing more refined solutions matched to the measurement problem are discussed in more general terms. 1.

Citation Download Citation

Piet J. Severin "In-situ film thickness monitoring in CVD and other thin-film deposition processes", Proc. SPIE 1266, In-Process Optical Measurements and Industrial Methods, (1 August 1990); https://doi.org/10.1117/12.20267

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